粉体および粉末冶金
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
研究
レーザーCVD法による構造傾斜イットリア膜の合成
木村 禎一Ryan Banal後藤 孝
著者情報
ジャーナル オープンアクセス

2005 年 52 巻 11 号 p. 845-850

詳細
抄録
Yttria films were prepared by laser CVD using an Y(dpm)3 precursor. When the laser power (PL) was less than 100 W, deposition rates were small around 10 μm/h comparable to those by conventional thermal CVD. At PL>160 W, deposition rates increased drastically to more than 200 μm/h. The highest deposition rate in this study was 270 μm/h, which is 100 times higher than that reported in literatures. Film morphologies changed from a dense isotropic structure to a (440) oriented columnar structure with increasing substrate pre-heating temperature. By changing PL during deposition, a structure-graded yttria film was obtained. Moreover, Periodically structure-graded yttria films were also prepared by periodical changing of PL.
著者関連情報
© 2005 一般社団法人粉体粉末冶金協会

本論文はCC BY-NC-NDライセンスによって許諾されています.ライセンスの内容を知りたい方は,https://creativecommons.org/licenses/by-nc-nd/4.0/deed.jaでご確認ください.
https://creativecommons.org/licenses/by-nc-nd/4.0/deed.ja
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