抄録
Monolithic and composite ceramic films of TiN, Ti-Al-N, Ti-B-C-N and PSZ were prepared at relatively higher deposition rate (approximately 100 nm/min) and at lower temperature (< 800°C) by a novel thermal plasma CVD designed to spray Ti-, Al-, B-, or Zr-alkoxide solutions into Ar/H2/N2 thermal plasma. Chemical compositions of composite films were controlled by changing of mixing ratios of two kinds of alkoxide solutions and N2 flow rates. PSZ films were prepared by mild oxidation of Y- and Zr-alkoxide solutions with water introduced into the thermal Ar/N2 plasma without oxidation of under layer TiN. Cutting tests of composite TiBCN films deposited on WC-Co cutting tools exhibited better wear resistance compared with commercial TiN coated cutting tools.
