抄録
The sputtering was applied to the vapor source of the gas evaporation technique which is one of physical techniques to produce ultrafine particles. Two kinds of sputtering techniques were tried; one is sputtering with an aid of a thermal electron and the other is the ordinary one with two parallel electrode plates. W, and Ag and Cu are chosen as a test sample. Particles of W, and Ag and Cu are formed by the former and the latter, respectively. Reactive sputtering results in the formation of WC1-x particles.
