Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Epitaxial growth of YBa2Cu3O7-x thin films
Takahito TerashimaYoshichika BandoKenji IijimaKazunuki YamamotoKazuto Hirata
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JOURNAL OPEN ACCESS

1988 Volume 35 Issue 9 Pages 870-874

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Abstract
The orientation of YBa2Cu3O7-x thin films grown on (110) planes of SrTiO3 by activated reactive evaporation was investigated by means of reflection high energy electron diffraction. The orientation of the films depended on the substrate temperature. The films with the (110) plane parallel to the substrate surface grew in the narrow range of substrate temperatures around 530°C, while the films with the (103) plane parallel to the surface grew at the temperatures above 600°C. The change of the epitaxial orientation with the substrate temperature was discussed refering the temperature dependence of the lattice mismatch between YBa2Cu3O7-x and SrTiO3.
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