抄録
The effects of applying a negative bias voltage on both magnetic properties and microstructure have been investigated for Co92Zr8(at%) films deposited by RF magnetron sputtering method. Low coercive force Hc and high permeability μ are obtained with negative bias voltage less than -75 V. Magnetostriction coefficient λs values for bias-sputtered films are smaller than those for non-biased films. The μ value for bias-sputtered films after 1000 hour heat treatment at 80°C decreases to approximately 80% of the initial value, while about a 40% decrease is shown for non-biased films. The decrease in λs values and the improvement in permeability stability can be explained in terms of structural difference between biassputtered and non-biased films. It is concluded that bias sputtered films with negative bias voltage less than -75 V have excellent capability as thin film head pole-piece materials.
