Magnetic thin films of FeTa-N-O were prepared by using the opposed target type dc magnetron sputtering method in Ar+N2+O2 plasma. Magnetic and structural properties were investigated as a function of the flow rates of introducing O2 and N2 into the Ar atmosphere. High Bs (19 kG) and soft magnetic properties (Hc≤0.3Oe, μ≥3000) were obtained in wide areas of O2 and N2 flow rates and were kept after high temperature annealing (at 600°C) From X-ray diffracted pattern of α-Fe(110), it was found that these soft magnetic films consist of fine grains. The addition of Ta and N2 together with O2 in a small amount was highly effective in improving the soft magnetic properties and ther thermal stability, because it decreased the magnetic anisotropy after annealing and prevented the grain growth of α-Fe.