抄録
The gas-flow-sputtering technique was used for in-situ alternate deposition of Ag vapor and Ni-Fe fine particles in order to form granular films. Deposits on microgrids were examined by transmission electron microscopy. The Ag vapor was assumed to consist of atomic species or very small clusters. The Ni-Fe particles were found to be changed in size from about 10 nm to 5 nm by controlling the preparation conditions, and to have the same composition as the target material. Ni80Fe20 particles were successfully embedded in an Ag matrix by this alternate deposition method.
