日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
論文
MCFを用いた3次元ナノレベル研磨
松尾 良夫山本 慶太中村 輝久花村 玲島田 邦雄
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ジャーナル オープンアクセス

2007 年 31 巻 1 号 p. 12-16

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抄録

This describes the presents development of a polishing technique for creating a nanometer-level mirror plane on the surface of planar-shaped and irregular-shape acrylic resin using MCF(magnetic compound fluid) paste and the new polishing machine manufactured by FDK. We found a relationship between the condition of the resin surface, the light transmittance, and the visibility, and clarified that the roughness of the acrylic resin surface is improved from the micron level (Ra 0.6 μm, Ry 4.5 μm) to the nanometer level (Ra 0.01 μm, Ry 0.09 μm) by using this method.

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© 2007 (社)日本応用磁気学会
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