抄録
This describes the presents development of a polishing technique for creating a nanometer-level mirror plane on the surface of planar-shaped and irregular-shape acrylic resin using MCF(magnetic compound fluid) paste and the new polishing machine manufactured by FDK. We found a relationship between the condition of the resin surface, the light transmittance, and the visibility, and clarified that the roughness of the acrylic resin surface is improved from the micron level (Ra 0.6 μm, Ry 4.5 μm) to the nanometer level (Ra 0.01 μm, Ry 0.09 μm) by using this method.
