アモルファスSm-Coスパッタ薄膜の作製と磁気異方性

抄録

Amorphous Sm-Co magnetic films were prepared by a magnetron sputtering onto glass substrates cooled by water. The sputtering equipment has two targets, above which substrates rotate during sputtering. The composition is controlled by the RF power supplied to each target.
It is shown that the film prepared by this method have planar magnetic anisotropy. The easy axis is along the radius direction of the substrate rotation. This can be interpreted in terms of self-shadowing effect by oblique-incidence sputtering deposition.
The films which have the perpendicular component of magnetization were also prepared under external perpendicular magnetic field. It is shown that this component increases as the strength of magnetic field increases, furthermore, with an electrical field.