日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
磁気光学
スパッタリング法による磁性体酸化物薄膜の形成
今川 尊雄成重 真治華園 雅信
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ジャーナル オープンアクセス

1985 年 9 巻 2 号 p. 121-124

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Crystal stractures and magnetic properties have been studied for magnetic oxde films prepared by a bias sputtering using garnet targets deposited on SiO2, GGG and sapphire substrates. The sputtered films were amorphous and those annealed at 700°C where crystallized. The films, which were sputtered at zero bias, were poly-crystalline garnet structures on any substrates. When bias voltage was applied during sputtering, singlecrystalline garnet films were formed on GGG substrates and oriented orthoferrite films were grown on sapphire substrates.

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© 1985 (社)日本応用磁気学会
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