イオンアシスト蒸着によるフッ素系高分子薄膜の作製

抄録

Fluoropolymer thin films were deposited by vapor deposition polymerization of 2-(perfluorohexyl) ethylacrylate (Rf-6) under irradiation by low energy Ar ions. Polymerization of Rf-6 was enhanced by increasing the ion energy, while no films were obtained without the ion irradiation. However, the surface energy also increased with increasing ion energy. At the optimum energy of 100 eV, uniform fluoropolymer thin films having surface energy of 10mJ/m² were obtained. The films were insoluble to organic solvents. The film had low refractive index of 1.371, which makes it attractive as an antireflective coating. By depositing a 100-nm thick polymerized film of Rf-6, the reflectivity of a glass substrate was reduced by 3.37% at a wavelength of 590nm. It is expected that the deposition-polymerized films of Rf-6 is attractive as antireflective and antipollution coatings on flexible devices.