1970 年 29 巻 6 号 p. 1532-1545
It has been shown that during the growth of thin Cr films condensed on Ultrahigh Vacuum cleaved NaCl and KCl crystals a New Modification of Cr (NMCr) appears, probably as a growth phase. On both substrates the NMCr appears in oriented structures closely related to the orientations of the substrate surface. Electron diffraction patterns caused by the NMCr can be completely interpreted by assuming the genuine A15 type structure. Subsidiary weak reflections which by structure factor considerations are forbidden can be satisfactorily explained by a double diffraction mechanism involving agglomerates of particles. Dark field examinations of the reflections have revealed three different particle orientations. Since the NMCr always appears together with bcc Cr the latter has also been investigated.
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