Journal of the Physical Society of Japan
Online ISSN : 1347-4073
Print ISSN : 0031-9015
ISSN-L : 0031-9015
Dynamic Control of a Cusped Plasma near the Ion Cyclotron Frequency
Shoji MiyakeTeruyuki SatoKazuo TakayamaTetsuo WatariShinji HiroeTsuguhiro WatanabeKodi Husimi
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1971 年 31 巻 1 号 p. 265-272

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An rf electric field near the ion cyclotron frequency is applied perpendicularly to the magnetic field of cusp regions in order to plug up cusp ends and to heat ions. A helium plasma is steadily fed from one of point cusps into the containment region whose density is varied from 1×108 to 1×1011cm−3. For the line cusp loss good plugging is satisfied up to 1×1011 cm−3, but for the point cusp loss it is not obtained for the density above 1×1010 cm−3. Under the resonance condition the ion energies consist of two components both of which display Maxwellian-like distribution of Ti of about 40eV and 150∼200eV respectively when Erf=100V/cm.
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