Journal of Surface Analysis
Online ISSN : 1347-8400
Print ISSN : 1341-1756
ISSN-L : 1341-1756
Extended Abstracts from 8th International Symposium on Practical Surface Analysis (PSA19)
Characterization of Al-doped ZnO thin films by laboratory-based hard X-ray photoelectron spectroscopy system
Ishiki TakedaHisao Makino
Author information
JOURNAL FREE ACCESS

2019 Volume 26 Issue 2 Pages 214-215

Details
Abstract
The highly transparent conductive Al-doped ZnO thin films were characterized by the laboratory-based hard X-ray photoelectron spectroscopy system using monochromatic Cr Kα line as an excitation X-ray source. The Al 1s core spectra of dopants can be measured in practically high throughput. The area intensity was proportional to the doping contents. The peak position of Al 1s systematically shifted to low binding energy with increasing the Al content. It was suggested that some correlations with the carrier concentration in AZO thin films.
Content from these authors
© 2019 by The Surface Analysis Society of Japan
Previous article Next article
feedback
Top