抄録
Redistribution behavior of B and O during silicidation process of titanium-silicon system at 923 K has been examined by secondary ion mass spectrometry and transmission electron microscopy. Amorphous like TiSix forms between unreacted Ti and TiSi2. B accumulates in TiSix and O accumulates in unreacted Ti. The solubility of B and O in Ti and TiSix causes the difference of redistribution behavior of B and O during Ti silicidation.
