The 63rd JSAP Spring Meeting 2016
Session ID : 21p-P5-1
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 63
Location : [in Japanese]
Date : March 19, 2016 - March 22, 2016
Fast local etching of Si substrates using inward plasma
*Jun Miyawaki, Ryo Kanou, Hiroshi Suga, Toshitaka Kubo, Atsushi Ando, Satoshi Takahashi, Shun'ichiro Shimbori, Tetsuo Shimizu
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