The 65th JSAP Spring Meeting 2018
Session ID : 19a-C101-7
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 65
Location : [in Japanese]
Date : March 17, 2018 - March 20, 2018
Ar+ ion implantation used to reduce temperature for activating B atoms implanted in silicon
*Keisuke Yasuta, Takuma Uehara, Masahiko Hasumi, Tomokazu Nagao, Yutaka Inouchi, Toshiyuki Sameshima
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