The 79th JSAP Autumn Meeting 2018
Session ID : 20p-438-5
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 79
Location : [in Japanese]
Date : September 18, 2018 - September 21, 2018
Effects to addition of H2 into Cl2 plasma at high temperature for etching of GaN
*Takahiro Omichi, Tanide Atsushi, Ishikawa Kenji, Tsutsumi Takayoshi, Kondo Hiroki, Sekine Makoto, Hori Masaru
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