Understandings of the kinetic balance between N incorporation and removal affected by SiC surface oxidation for 4H-SiC/SiO2 structure in high-temperature N2 (+O2) annealing

Yang Tianlin; Koji Kita

doi:10.11470/jsapmeeting.2022.1.0_2489

The 69th JSAP Spring Meeting 2022

Session ID : 24p-E302-11

DOI https://doi.org/10.11470/jsapmeeting.2022.1.0_2489

Conference information

Host: The Japan Society of Applied Physics

Name : JSAP Spring Meeting

Number : 69

Location : [in Japanese]

Date : March 22, 2022 - March 26, 2022

Understandings of the kinetic balance between N incorporation and removal affected by SiC surface oxidation for 4H-SiC/SiO₂ structure in high-temperature N₂ (+O₂) annealing

*Yang Tianlin, Koji Kita

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Keywords: 24p-E302-11, SiC surface nitridation, Nitridation kinetics, High-temperature N2 annealing

CONFERENCE PROCEEDINGS FREE ACCESS

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