抄録
Solvents used in industrial cleaning processes have been required to be replaced with safer ones from ecological view point. For example CFC (Chlorofluorocarbon) was replaced with HFE (Hydrofluoroether) or HFC (Hydorofluorocarbon) to avoid ozone depletion and SPM (Sulfuric acid / Hydrogen peroxide water mixture) was replaced with ozonated water or supercritical fluid. Replacement of these well-known compounds to new materials requires improvement of rinse and drying processes as well because the new solvents have notably different properties from the conventional ones. In this report outline of the advanced cleaning technologies in electronic industries are described and improvement of cleaning process using HFE solvent is explained based on thermodynamics.
https://ror.org/01pa62v70 
