抄録
A novel technology to fabricate hydrophobic surface in microchannel was developed by using electrochemical etching of N-type silicon. It is found that pores of diameter of a few micrometer are formed in a high density on both bottom and side walls of microchannels. In order to maintain stable wettability, thin deposition of noble metal is also tested and contact angle as high as 155 degree is accomplished. This technique is simple to fabricate and effective for the microchannel-based fluidic systems for the future micro space systems.
