Dynamics & Design Conference
Online ISSN : 2424-2993
セッションID: 456
会議情報
456 磁気応答流体の新しいポリッシングに関する研究 : 種々の研磨条件による違い
島田 邦雄呉 勇波松尾 良夫
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会議録・要旨集 フリー

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This study is the development of new float polishing technique utilizing magnetic compound fluid(MCF) that has been developed as one of magnetic responsive intelligent fluids by one of authors. The float polishing technique has large gap between the polished and polishing surfaces and carries on the mirror finished flat surface. Various factors with the effect on the float polishing were shown, for example, the types of polishing tool with magnet, the float polishing style with both motion of the polishing tool, the rotational speed, the kind of the polished specimen, and et al..
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© 2006 一般社団法人 日本機械学会
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