抄録
The present study clarified that there are effects of UV and plasma flow on the sterilization of Escherichia coli. It is possible to sterilize E.coli on plasma exposure temperature of 383K although the heated argon gas can't sterilize at same exposure temperature of the plasma flow. The sterilization mechanism of plasma flow was clarified by observing a shape variation analysis of SEM and the potassium leakage of the ICP-MS method. The destruction of the cytoplasmic membrane under plasma exposure and the destruction of nucleic acids by ultraviolet rays within the range of sterilizing the effective wave length of 282 nm and 309 nm from the plasma irradiation cause inactivation of E.coli.
