抄録
In the photoresist stripping process of semiconductor manufacturing, the cleaning method with the ozone water and a disk-shaped nozzle is proposed. The three-dimensional flow structure of the ozone water in between a rotating silicon wafer and the disk-shaped nozzle affects photoresist stripping rate. The purpose of the present study is to reveal this flow structure. In order to realize it, the visualization experiment with dye and stereoscopic micro PTV are conducted. The injected dye forms contrasting density. And a high concentrated area is indicated near the disk end. From this result, it is cleared that there is a transition radius of flow structure. On the other hand, stereoscopic micro PTV result suggests that the flow direction changes from radial to rotational at the transition radius. Furthermore, it is cleared that backward flow exists along radial axsis near the stationary disk outside the transition radius.
