ラバルノズル内における固相変化を伴う極低温微粒化と粒子衝突挙動に関する数値予測

抄録

Thermal and fluid dynamic behavior of cryogenic micro-solid nitrogen particles produced by a superadiabatic laval nozzle using single-component transonic nitrogen flow was developed and numerically investigated in application to nano-order semiconductor device cleaning. To investigate the characteristics of nano-order semiconductor device cleaning, elucidating the atomization process in laval nozzle is neccesary. Governing equation based on LES-VOF model is applied to clarify the sequential process of liquid atomization of primary break up to secondary breakup of cryogenic fluid in laval nozzle, and integration with experimental study was conducted to verify the availability of cryogenic cleaning technology.