JSME Materials and Processing Conference (M&P)
Online ISSN : 2424-2861
10.1
会議情報
512 MECHANISTIC UNDERSTANDING OF MATERIAL DETACHMENT DURING MICRO-SCALE POLISHING
Wei CheYongjin GuoAshraf BastaworsAbhijit Chandra
著者情報
会議録・要旨集 フリー

p. 331-336

詳細
抄録
A combined experimental and modeling (both numerical and analytical) approach has been devised to understand the material removal mechanism during abrasion of ductile copper discs. First, single grit scratch intersection experiments are conducted at the micro-scale (with 1-30μm depth of cut). This is followed by FEM analysis. Then a simple analytical model is developed, and the model prediction is verified against experimental observations and results from numerical simulations. The insights gained from this exercise may be used to develop a mechanistic model of material removal in chemical mechanical polishing (CMP) of ductile materials.
著者関連情報
© 2002 The Japan Society of Mechanical Engineers
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