The control of vibration is important for high technology field such as semiconductor manufacturing. In this field, active vibration isolation device has achieved good performance to reduce vibration. But recently, stage device is bigger and stage movement is more quickly. Therefore the reaction force for vibration isolation is bigger and transmitted to the floor. In this study, in order to solve this problem, we developed an active vibration system using inertial force generators. Dual Model Matching control method is adopted for this system. We confirmed effectiveness of vibration isolation by experiment.