抄録
This paper describes novel technique to fabricate nano-scale cross-linked structure of metal thin film using transfer printing. Au thin-film is deposited on a micro-grooved h-PDMS stamp. Stamping the h-PDMS enables the Au film to be transferred onto a micro-grooved surface of SU-8 substrate. The transferred thin-film successfully forms to be cross-linked structure, of which the length and thickness is 10 - 50 um and less than 100 nm, respectively. The wettability and surface roughness of the h-PDMS stamp affect production yield and crack length of the fabricated nano-structure. An increase of surface roughness and contact angle improves its form accuracy and production yield. It is demonstrated the proposed process is utilized for a fabrication of MEMS elements.
