抄録
To achieve a perfectly damage-free surface by fixed abrasive, this research has proposed a new chemo-mechanical-grinding (CMG) process by effective using chemical reaction at the grinding process. First described in this paper are the experimental results showing the feasibilities of the CMG process in reducing subsurface damage, followed by development and characterization of CMG wheel with a wide range of pH from acidity to alkalinity. The CMG process has been applied mainly into φ300mm bare Si wafers, and its performance has been evaluated by comparing to grinding with diamond wheels.
