Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
Online ISSN : 2424-3086
ISSN-L : 2424-3086
セッションID: 3299
会議情報
3299 Patterned self-assembly of fine particles and its application to polishing tool
Nobuyuki MORONUKIW. R. ZHANG
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会議録・要旨集 フリー

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抄録
This study aims to discuss an application of self-assembled particles to a polishing tool. Self-assembly of fine particles is obtained by drying colloidal suspension on a substrate. Using dispenser and motored stage, the assembly can be obtained along specific profile like spiral. The assemblies are transferred to another substrate on which ultraviolet curing resin is spin-coated and cured while pressing the substrates each other. Silica particles of 1μm diameter were assembled over 20mm square and applied to polishing to evaluate the performance. It was found that the glass plate was machined with smooth finish. However, the particles drop off under severe conditions.
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© 2011 一般社団法人 日本機械学会
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