抄録
Ultraviolet (UV) nanoimprint lithography (NIL) is a candidate method for the mass production of nanoscale fabrications. Thus, the release coating method used in the mold is very important. In this paper, we examine a fluorinated diamond-like carbon (F-DLC) coating. It is found that an intermediate layer of 20 nm is needed for adherence between the silicon mold and F-DLC, and that an F-DLC coating of 100 nm thickness enables over 1000 UV-NIL transfers.
