抄録
Using electron beam lithography (EBL), we have developed a fabrication method for nanopatterned roll molds that enables roll-to-roll nanoimprint lithography. A positive-type electron beam resist and an aluminum roll substrate perform the EBL process while rotating the roll substrate in a vacuum. In this study, we investigate the fabrication characteristics of a line-and-space pattern and a dot pattern by using EBL with a rotating stage. As a result, we successfully fabricate a sub-100 nm line-and-space pattern and dot pattern onto the roll mold.
