Improvement of transfer durability of a pillar-shaped release-agent-free replica mold in ultraviolet nanoimprint lithography

抄録

Ultraviolet Nanoimprint lithography (UV-NIL) can fablicate nano-scale patterns, and expected as a low-cost and large number of production technique. We have evaluated a transfer durability of a replica mold. Using replica mold is effective technique to prevent a master mold, but pillar shaped replica mold has many defects and adhesion of the transfer resin by repetition transfer. In order to solve these problems, we have improved the UV-curable resin materials. In this paper, we transferred large amount of nano-scale patterns and evaluated of error rate and contact angle of this improved release agent -free hard replica mold. The release agent-free hard replica mold can transfer up to 1200 imprint times.