機素潤滑設計部門講演会講演論文集
Online ISSN : 2424-3051
セッションID: 1308
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1308 プラズマCVD法を用いたSi-CNxHy膜の摩擦特性の評価(トライボロジー(2))
北爪 一孝上坂 裕之野老山 貴行梅原 徳次不破 良雄真鍋 和幹
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Amorphous Carbon Nitride (CNx) coating is an attractive material that satisfies both relatively high hardness and ultra-low friction coefficient. We tried to obtain CNx by using plasma-enhanced chemical vapor deposition (PECVD), which is more suitable for 3-dimensional coating than typical physical vapor deposition methods. In this work, the friction characteristic under oil lubricated of the Si-CNxHy film deposited by PECVD was made clear from the relation between the Raman spectroscopic analysis which is an index of carbon structure, and friction coefficient.
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