抄録
The plasma is applied to the light source, such as fluorescent lamp. When the wavelength is short in deep UV, LD is difficult to realize. In this research, Si device for atmospheric plasma light source is designed and fabricated. The size of the device is 2x8 mm2, the width of light emitting area is 150 pm and depth of that is 200 p.m. For enhancing the ignition, the floating electrode is designed to be in the micro gas channel. This electrode has the bow tie shaped projection part disturbing the laminar flow. The device is placed near the copper spiral coil, which is connected to 100MHz high-frequency power source via the impedance matching box. When the magnetic field from the coil passes through the patterned metal in the device, the induced voltage occurs. The plasma ignites in the device. The input power is 138W. He gas flow rate is 49.0m1/min.
