主催: 一般社団法人 日本機械学会
会議名: 2020年度 年次大会
開催日: 2020/09/13 - 2020/09/16
With improvements based on the publicly available STL data of the mask(1), a mask that satisfies the following conditions was developed, eyeglasses will not fog, the skin does not get itchy, small suction resistance. The inhalation resistance of the mask was found to be proportional to the square of the flow rate, and it was found that the inhalation resistance of the developed mask was smaller than that of the commercially available masks.