電解エッチング法によるモリブデンマイクロマシニング技術の開発

抄録

This paper reports on the development of molybdenum microfabrication technology for MEMS sensor applications. In this research, molybdenum microfabrication was performed under various conditions using an electrolytic etching process. The duty ratio, agitation, and processing time were changed in the processing conditions, and the etch rate and etch factor were evaluated, respectively. The optimized conditions were a duty ratio of 75% under constant agitation. This is thought to be caused by a thinner diffusion layer formed on the surface of the electrode by the electrolytic process. On the other hand, the diffusion layer on the processing side wall improves the etch factor by reducing the processing speed of the side wall. The etching profiles obtained by the electrolytic etching showed a higher etch factor than those obtained by a wet chemical etching method. Finally, an etch factor of about 1.5 and an etch rate of 1.0 μm/min was obtained under the optimum conditions.