Ar/CH₄混合ガスを用いたICPプラズマの3D解析

抄録

This paper discusses inductively coupled plasma discharge which is widely used in semiconductor fabrication processes, from view point of numerical evaluation. Three-dimensional asymmetric simulation is performed using COMSOL Multiphysics^Ⓡ. Mixture gas of Ar/CH₄ is introduced as a reaction gas. Two different modelling methods for coil are investigated. It is shown that modelling the coil as a boundary type is an optimized method, comparing to model the coil as a domain type.