抄録
We have developed a fabrication method of a high aspect ratio nanoscale pit by a scanning tunneling microscope using a carbon nanotube (CNT) as the probe. The CNT probe used in this study is homebuilt CNT probe using CNT of 20-30nm in the diameter. The nanoscale pits were produced in Au thin film in an ambient pressure and room temperature. The results of our experiment show that the depth of the fabricated pit increased with the increase in the fabrication time, with little change in the diameter of the fabricated pit. We realized the fabricated pit of the diameter of 60nm with the aspect ratio of 4.5. Moreover, it was found that the fabrication method is applicable to not only Au thin film but also silicon single crystal. This demonstrates that CNT probes can be useful for fabricating nanoscale structures.
