年次大会講演論文集
Online ISSN : 2433-1325
セッションID: S0303-1-2
会議情報
S0303-1-2 Ni-Ti形状記憶合金表面からの金属イオン溶出挙動と生体細胞への影響(形状記憶合金の特性と応用展開(1))
水谷 正義松村 有希子小茂鳥 潤
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会議録・要旨集 フリー

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In order to improve the biocompatibility of a Ti-Ni alloy, mechanically polished Ti-Ni samples were subjected to isothermal oxidation (TO) in N_2-20vol%O_2 at temperatures of 573 or 773K. Cell culture tests were conducted with L929 fibroblast cells to examine the cell proliferation. The specimens TO-treated at 773K and below showed good cell compatibility because the Ni-free surface layer prevented the Ni ions from diluting into the culture. In addition, cell culture tests with Ni ion induced alteration of cellular morphology, decreased number of adherent cells. These results indicate that cell proliferation is influenced by amount of more than 30mg/1 of Ni ion.
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