The proceedings of the JSME annual meeting
Online ISSN : 2433-1325
III.01.1
Session ID : F-0507
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F-0507 Highly Function of Ceramics by Electrolytic In-Process Dressing (ELID) Grinding
Yutaka WATANABEKazutoshi KATAHIRAHitoshi OhmoriHideto SUZUKI
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Abstract
It is known that TiAlN film by PVD could be one of the prospective hard layers to enhance the wear and thermal oxidation resistances of tools overcoming the shortcomings of TiN and TiCN coatings. However, the surface roughness of that films are not enough to achieve higher tribological characteristics. The aim of this paper is to highlight Electrolytic In Process Dressing (ELID) grinding experiments of TiAlN film and the characterization of triborogical behaviors. The scanning electron microscopy (SEM) also showed improvement of the ELID ground TiAlN film surface with respect to the shape of the grinding marks, and ELID ground TiAlN film produced excellent results in terms of triborogical behaviors. Typical surface roughness of ELID ground TiAlN film is around Ra 0.0062 μm with a #4000 wheel. While friction coefficient μ of TiAlN film (non-ELID grinding) remained higher level about 0.87, that of ELID ground TiAlN film remained lower level about 0.17.
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© 2001 The Japan Society of Mechanical Engineers
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