Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
2003
会議情報
P-MN-03 NANOFABRICATION OF SILICON BY MECHANO-CHEMICAL PROCESSING AND ITS APPLICATION TO ETCHING MASK FOR POTASSIUM HYDROXIDE SOLUTION
Shojiro MIYAKEJongduk KIMHirokazu YAMAMOTO
著者情報
会議録・要旨集 フリー

p. 383-384

詳細
抄録
Nanometer scale protuberance and groove were processed on a silicon surface by diamond tip sliding using atomic force microscope (AFM) in an atmosphere. To produce the three dimensional nano profile, the processed profile dependence on load was evaluated, and then KOH solution etching was applied on the processed surface. Mechanochemically processed protuberance, groove and flat (undeformed) processed areas act as etching mask for KOH solution.
著者関連情報
© 2003 The Japan Society of Mechanical Engineers
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