抄録
We have fabricated nano-groove surfaces using a novel nano-patterning method. One of biggest features of the proposed method is capability of fabricating nano-grooves for a wide area more than 100×100 mm^2. First, we fabricated micro-scale patterns to a silicon substrate by photolithography. Second, multilayer films were deposited by physical vapour deposition (PVD) process. For multilayer films, combinations of iron and gold (Fe-Au), and other materials were applied. Third, the substrate was polished and different material appeared on the surface as parallel stripes. Finally, additional etchings that are physical or chemical treatments applied to get nano-grooves. In this paper, we introduce some of nano-patterned surfaces.
