Ti/Si多層ナノ薄膜の応力誘起化学反応開始の力学条件

抄録

In order to clarify the mechanical criterion of stress-induced chemical reaction of Ti/Si multilayered-nano-films, we conducted compression experiments for specimens with a notch fabricated from the Ti/Si multilayer by focused ion beam. Compressive displacement in the stacking direction was applied to the specimen by a diamond flat-punch tip using a nano-indenter under in situ field emission scanning electron microscopy observation. In the experiments, stress relaxation occurred when the displacement was held in the region where the nominal stress was 3000 MPa or higher. The stress relaxation also increased as the stress increased. In addition, transmission electron microscope observation after compression showed that a new layer with no multilayered structure was generated on the free surface at the notch. These results suggest the presence of a mechanical criterion of the stress-induced chemical reaction.