積層構造体におけるリップロケーションの変形メカニズム解析

抄録

Recently, a new defect termed ripplocation described as an atomic layer ripple was coined to explain the deformation in layered solids. In this study, we use the molecular dynamics method to generate ripplocation by applying local strain from the armchair direction of ABA type multilayer graphene. In order to investigate the periodicity of ripplocation nucleation, we are going to take out the top layer of the middle layers separately and do a comparative simulation on the wavelength of ripplocation. Furthermore, by calculating the mean curvature and potential energy of the surface, we can observe the result is consistent with the surface formed after the ripplocation nucleation. These results are of great significance for elucidating the boundary conditions and regularity of ripplocation nucleation in layered solids. And we suspect that the special deformation mechanism of ripplocation is highly likely to be applied to high-performation materials.