C27 The high efficient polishing technology for sapphire wafer using electrical abrasives control technique : 2nd report

Abstract

It takes a lot of time to process the single crystal sapphire substrates for LED, because it is hard process material and its diameter trend becomes larger for productivity improvement. Therefore we have attempted to develop the novel processing technologies that enhance the process ability of sapphire substrates. This paper describes the results pertaining to the evaluation of sapphire substrates polishing. It was confirmed the applied AC electric field leads to enhance removal rate, while the surface roughness was comparable.