抄録
Using the electric field-assisted solid-state ion exchange method, metal ions were doped into a borosilicate glass surface. Especially when silver was used as a dopant material, a buried silver precipitation layer was formed in the ion-doped area by additional voltage application. For the industrial application of the precipitates to internal electrical circuits, it is necessary to control the shape of silver doped/precipitated area. In this study, we investigated the influence of shape/location of used electrodes on the shape of silver-doped area. When the upper and lower electrodes were located in opposite direction, the silver-doped area with uniform depth was formed. On the other hand, the inclined doped area was formed with diagonally located electrodes to the glass. This result shows the silver ions tend to move toward a neighboring cathode plate. In addition, it was suggested that the cathode plate played a role of outlet of sodium ions ejected from glass substrate.
