抄録
A high throughput fabrication process for a multilayer nanodot array is developed. This process is composed with two stages. As for the first stage, a quartz substrate is coated with Au layer by spatter deposition. Then, a nano groove grid pattern is fabricated on the Au layer by Nano Plastic Forming method. Finally, annealing is applied to the substrate to generate a nanodot array by self-organization. As for the second stage, SiO_2 spacer layer is deposited on the nanodot array. Then, Au layer is deposited on the SiO_2 layer. The substrate is annealed to generate a nanodot array on the spacer layer. A multilayer nanodot array is fabricated by repeating the deposition and annealing process. Effects of process parameters, such as thickness of Au layer and the spacer layer is studied experimentally. Based on these results, process parameters are optimized, and feasibility of this process was verified.
