抄録
Multilayered films with sub-100nm thick bilayers made of light metal and transition metal shows self-propagating explosive reaction, which is attractive as local heat source. By using the films, the authors have so far succeeded in flash solder bonding of Si wafers for hermetic package. However, multilayered films restrict applications because finely forming the films to free dimensions is difficult. To explore other applications, fabricating micro-sized particles having exothermic reaction function is required. In this paper, a new technique for fabricating exothermic reactive micro-scale particles is described. A dual-source magnetron sputtering apparatus was used for particle fabrication. The heat generation performance of the particles was compared to that of the films using differential scanning calorimeter (DSC) and high speed charge coupled device (CCD) camera.
