This paper reports the effect of ppb-level non-ionic surfactant, Triton-X-100, on the etching of Si {100} and Si {110} in 5wt%,15wt%,30wt%,48wt% KOH solution. In pure 5 wt% KOH solution, micro-pyramids appear on the Si {100} etched surface. However, in 5wt%KOH with addition of ppb-level of Triton, the etched surface becomes mirror-like. This result shows that a ppb-level of Triton is adsorbed on the silicon surface during etching.